|
|
| |
|
|
|
|
|
|
 Click to enlarge image
|
- Based on running water stirred by high-frequency ultrasound to remove contaminant
particles on glass and silicon wafers, etc.
- Continuous supply of clean running water eliminates the possibility of recontamination
by detected dirt.
- High frequency vibration removes microscopic contamination without damaging
wafers, etc
- With the ability to process piece by piece, the megasonic shower type can
be readily integrated into an existing production line
| MODEL |
ULMS-600 |
ULMS-400 |
ULMS-300 |
ULMS-200 |
ULMS-100 |
| HIGH FREQ. OUTPUT POWER |
750W |
600W |
450W |
300W |
150W |
| OSCILLATIO FREQ |
1MHz |
| POWER SUPPLY |
AC110V~220V |
| OPERATING TEMP.RANGE |
LIMIT60°C |
| EFFECTIVE CLEANING RANGE |
600x2 |
400x2 |
300x2 |
200x2 |
100x2 |
| WATER FLOW RATE |
45L/min |
35L/min |
30L/min |
18L/min |
7L/min |
DIMENSION GENERATOR
NOZZLE(WxHxL) |
370x190x210(WxLxH) |
| 130X70X600 |
130X70X400 |
130X70X300 |
130X70X200 |
130X70X100 |
| WATERINLET |
1/2" |
| OUTPUT CABLE |
5m |
| POWER CABLE |
1.5m |
|
|
|
|
| |
|
|
|
Related Keywords:
Bookmark / Share this page